Overview
The SC-1 is a ground-breaking and high-performing cluster equipment that combines Atomic Layer Deposition (ALD) with Physical Vapor Deposition (PVD) in an extremely compact, modular, and fully automated system for high-throughput production of multinanolayered coatings from the ALD and PVD materials library.
This innovative patent-pending cluster system revolutionizes the traditional
cluster equipment, as it eliminates the need for transfer arms and multiple
antechambers, which occupy a significant amount of lab space, with high
acquisition, operating and maintenance costs.
Capable of performing both (PE)-ALD and PVD without breaking
the vacuum or move the samples between chambers to fabricate
hundreds of multinanolayered films, reducing fabrication time.
Scalable, modular and flexible system that allows to easily
increase or decrease chamber dimensions, adapt new
hardware and incorporate multiple in-situ metrology equipment.
